Open AccessAluminum oxynitride dielectric films prepared by reactive sputtering
Author(s) -
О. Мачулянський,
A. Borisova,
M. Rodionov,
В. Смілик,
Iu. I. Iakimenko
Publication year - 2015
Publication title -
èlektronika i svâzʹ
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2312-1807
pISSN - 1811-4512
DOI - 10.20535/2312-1807.2015.20.3.53591
Subject(s) - sputtering , auger electron spectroscopy , materials science , silicon oxynitride , sputter deposition , dielectric , aluminium , chemical engineering , analytical chemistry (journal) , thin film , optoelectronics , nanotechnology , silicon , composite material , chemistry , organic chemistry , silicon nitride , physics , nuclear physics , engineering