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Effects of Xe content on wall‐voltage variation during address period in AC plasma‐display panel
Author(s) -
Jang SooKwan,
Park ChoonSang,
Tae HeungSik,
Shin Bhum Jae,
Seo Jeong Hyun,
Jung EunYoung
Publication year - 2010
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/jsid18.8.614
Subject(s) - electric field , xenon , plasma display , voltage , intensity (physics) , materials science , plasma , atomic physics , electrode , analytical chemistry (journal) , optics , chemistry , physics , nuclear physics , quantum mechanics , chromatography
— To investigate the influence of the gas condition, especially xenon (Xe) gas, on the wall‐voltage variation in relation to the electric‐field intensity during the address period, the wall voltages were measured under various Xe‐gas content ranging from 11 to 20% by using the V t closed curve analysis method. It was observed that under a weak electric‐field intensity between the scan and address electrodes, the change in Xe content did not affect the wall‐voltage variation, even at a higher panel temperature of 65δC. However, under a strong electric‐field intensity, the wall‐voltage variations were reduced with an increase in the Xe content, confirming that a higher electric‐field intensity would be required to induce the wall‐voltage variation at a higher Xe content during the address period.