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Development of rollable silicon thin‐film‐transistor backplanes utilizing a roll‐to‐roll continuous lamination process
Author(s) -
Takechi Kazushige,
Yamaguchi Shinya,
Tanabe Hiroshi,
Kaneko Setsuo
Publication year - 2010
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/jsid18.6.391
Subject(s) - backplane , thin film transistor , materials science , lamination , etching (microfabrication) , composite material , optoelectronics , electrical engineering , layer (electronics) , engineering
— Rollable silicon thin‐film‐transistor (TFT) backplanes utilizing a roll‐to‐roll process have been developed. The roll‐to‐roll TFT‐backplane technology is characterized by a glass‐etching TFT transfer process and a roll‐to‐roll continuous lamination process. The transfer process includes high‐rate, uniform glass‐etching to transfer TFT arrays fabricated on a glass substrate to a flexible plastic film. In the roll‐to‐roll process, thinned TFT‐glass sheets (0.1 mm) and a base‐film roll are continuously laminated using a permanent adhesive. Choosing both an appropriate elastic modulus for the adhesive and an appropriate tension strength to be used in the process is the key to suppressing deformation of the TFT‐backplane rolls caused by thermal stress. TFT backplanes that can be wound, without any major physical damage such as cracking, on a roll whose core diameter is approximately 300 mm have been sucessfully obtained. Incorporating the TFT‐backplane rolls into other roll components, such as color‐filter rolls, will make it possible to produce TFT‐LCDs in a fully roll‐to‐roll manufacturing process.