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P‐159: Slit Pattern for Dynamic Stability of TN‐VA LCD
Author(s) -
Chen Xiaohui,
Cui Hongqing,
Chung TeChen,
Jen TeanSen
Publication year - 2011
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3621210
Subject(s) - twist , disclination , liquid crystal , transmittance , materials science , liquid crystal display , optics , slit , distortion (music) , stability (learning theory) , boundary (topology) , optoelectronics , physics , computer science , geometry , mathematics , amplifier , mathematical analysis , cmos , machine learning
Abstract We investigated the dynamic stability of disclination lines (DLs) generated near the boundary of adjacent domain with different Liquid crystal orientation in the conventional multi‐domain twist nematic‐vertical alignment (TN‐VA) LCDs. The Liquid crystal molecules collide with each other at the reverse twist boundaries due to the strong reverse twist force competitions at a high voltage, and pushes DLs deeply penetrate into the active region, resulting in a decreased transmittance in the panel. To ameliorate these drawbacks, the slit pattern was induced at the location of reverse‐twist boundary with the function to suppress the reverse twist force and eliminates the distortion, thus make DLs remain very slim near boundary areas. As a result, the transmittance dynamic stability is greatly improved.