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P‐206L: Late‐News Poster : Colour Filter ITO Deposited with Rotary Sintered Ceramic ITO Targets
Author(s) -
Lippens Paul,
Haldemann Mark
Publication year - 2011
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3621111
Subject(s) - ceramic , materials science , coating , planar , sputtering , filter (signal processing) , point (geometry) , yield (engineering) , film coating , power consumption , power (physics) , thin film , composite material , nanotechnology , computer science , electrical engineering , mathematics , engineering , physics , computer graphics (images) , geometry , quantum mechanics
Recently, sintered ceramic rotary ITO targets have received strong interest from the display industry. The considerably higher target utilization (TU, up to 90 %), i.e. more than a factor two better compared to planar counterparts, is the main point of attraction. Such higher target utilization gives indeed rise to much lower coating costs. However, the advantages go far beyond that: not only do rotary sintered ceramic ITO targets sputter quasi nodule free, which results in higher process stability and a better product yield, but such targets allow for higher power loads. It will be shown that higher power loads — compared to values closer in line with planar magnetrons ‐ don't negatively impact ITO thin film properties. The work will also point to total coating cost differences between the new technology and the state‐of‐the‐art.