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P‐75: Development of High Viscous Color Photo Resists for Color Filter Repair
Author(s) -
Chang MyungHwan,
Ryu JeeHyun,
Han GyuSeok,
Chang TuWon
Publication year - 2011
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3621101
Subject(s) - resist , viscosity , color gel , filter (signal processing) , materials science , solvent , composite material , process engineering , optics , pulp and paper industry , chemistry , computer science , organic chemistry , engineering , computer vision , layer (electronics) , thin film transistor , physics
The organic materials used in color filter were mainly consisted of insoluble particles, and generate the defects during a color filter manufacture. The bad quality of display resulted in the decrement of productivity and high production costs; in addition, a bad effect on the rising environmental and energy saving concerns. In this study, we are concentrated on the development of a repair resist. New solvent having a high boiling point was employed for main solvent and resist formulation was developed based on the viscosity, fluidity, and chroma.