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63.3: Back‐exposure Manufacturing Route for MEMS Reflective Display
Author(s) -
Park HyunChul,
Oh JinHo,
Choi HakNyun,
Kim YongSeog
Publication year - 2010
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3500637
Subject(s) - microelectromechanical systems , lift (data mining) , manufacturing process , process (computing) , computer science , pixel , materials science , artificial intelligence , optoelectronics , composite material , data mining , operating system
In this study, we attempted a new manufacturing route for an interferometric modulator type MEMS display. Instead of conventional pattern forming process, we developed back‐exposure procedure combined with lift‐off process to reduce the number of masks and alignment steps used. The pixel structure manufactured revealed that this new procedure is capable of producing the device with high accuracy and quality.