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4.3: An Ultraslim Border TFTLCD Technology Using Gate Fanout in Active Area
Author(s) -
Tu YenCheng,
Chen Bofeng,
Peng JenChien,
Wu YungHsun,
Yang Chiulien
Publication year - 2010
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3500447
Subject(s) - computer science , quality (philosophy) , electronic engineering , electrical engineering , engineering , physics , quantum mechanics
We proposed an ultraslim border of TFTLCD using Gate fan out In Active area GIA technology. This method can achieve slim border without using aSi Gate driver ASG [1][2]. The experimental results show that GIA technology does not affect the quality of display. The optical and electrical properties are also discussed in this paper. A 2.22” QVGA ultraslim border 0.8mm panel by using GIA technology was demonstrated as well.

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