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P‐123: Patterned Rubbing Alignment Technology
Author(s) -
Muravsky Alexander,
Agabekov Vladimir,
Zhavnerko Genady,
Mahilny Uladzimir,
Stankevich Alexander
Publication year - 2010
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3500303
Subject(s) - rubbing , photoresist , materials science , layer (electronics) , deposition (geology) , anchoring , optics , optoelectronics , nanotechnology , composite material , engineering , geology , physics , structural engineering , paleontology , sediment
We report novel low temperature liquid crystal alignment technology that offers unique pattern regulation by high anchoring rubbing method. Photoresist properties of alignment layer allow consequent deposition, rubbing, non‐polarized photoexposure and wet development for mask defined surface aligning pattern. Both analysis of the surface by AFM and cell samples with pattern alignment are presented.