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P‐93: Silicon Nanocrystals Embedded in Silicon‐rich Silicon Nitride Films for Application of Light Emitting Diodes in Flexible Display
Author(s) -
Lee KyoungMin,
Hong WanShick,
Hwang JaeDam,
Lee YounJin,
No KilSun
Publication year - 2010
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3500031
Subject(s) - materials science , silicon , silicon nitride , optoelectronics , hybrid silicon laser , semiconductor , diode , annealing (glass) , silicon on insulator , nitride , nanocrystal , nanotechnology , composite material , layer (electronics)
Abstract The silicon nanocrystals embedded in silicon‐rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200 °C). Excimer laser annealing and in‐Situ H 2 treatment were performed to increase quantum efficiency. Electrical properties of metal‐insulator‐semiconductor structures using these samples were measured.