P‐93: Silicon Nanocrystals Embedded in Silicon‐rich Silicon Nitride Films for Application of Light Emitting Diodes in Flexible Display | Zendy

Lee KyoungMin | Zendy; Hong WanShick | Zendy; Hwang JaeDam | Zendy; Lee YounJin | Zendy; No KilSun | Zendy

Premium

P‐93: Silicon Nanocrystals Embedded in Silicon‐rich Silicon Nitride Films for Application of Light Emitting Diodes in Flexible Display

Author(s) -

Lee KyoungMin,

Hong WanShick,

Hwang JaeDam,

Lee YounJin,

No KilSun

Publication year - 2010

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.3500031

Subject(s) - materials science , silicon , silicon nitride , optoelectronics , hybrid silicon laser , semiconductor , diode , annealing (glass) , silicon on insulator , nitride , nanocrystal , nanotechnology , composite material , layer (electronics)

The silicon nanocrystals embedded in silicon‐rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200 °C). Excimer laser annealing and in‐Situ H 2 treatment were performed to increase quantum efficiency. Electrical properties of metal‐insulator‐semiconductor structures using these samples were measured.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research