79.1: Advanced Sputtering Equipment Design for FPD | Zendy

Matsudai Masasuke | Zendy; Sato Shigemitsu | Zendy; Ohno Tetsuhiro | Zendy

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79.1: Advanced Sputtering Equipment Design for FPD

Author(s) -

Matsudai Masasuke,

Sato Shigemitsu,

Ohno Tetsuhiro

Publication year - 2010

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.3499878

Subject(s) - liquid crystal display , footprint , productivity , sputtering , thin film transistor , market share , business , manufacturing engineering , engineering , computer science , materials science , nanotechnology , operating system , economics , finance , thin film , paleontology , macroeconomics , layer (electronics) , biology

ULVAC Sputtering System for LCD TFT‐array & TCO has maintained leading market share by offering latest technology fulfilling market needs, in every generation since the LCD market growth in the 1990's. Particularly, equipment design has made a big change since 7.5 th generation with “Simple, Small‐footprint, High‐productivity” as keywords.

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