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79.1: Advanced Sputtering Equipment Design for FPD
Author(s) -
Matsudai Masasuke,
Sato Shigemitsu,
Ohno Tetsuhiro
Publication year - 2010
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3499878
Subject(s) - liquid crystal display , footprint , productivity , sputtering , thin film transistor , market share , business , manufacturing engineering , engineering , computer science , materials science , nanotechnology , operating system , economics , finance , thin film , paleontology , macroeconomics , layer (electronics) , biology
ULVAC Sputtering System for LCD TFT‐array & TCO has maintained leading market share by offering latest technology fulfilling market needs, in every generation since the LCD market growth in the 1990's. Particularly, equipment design has made a big change since 7.5 th generation with “Simple, Small‐footprint, High‐productivity” as keywords.