Premium
49.1: Fabrication of 23” PVA LCD Panel by Laser Ablation Process of ITO
Author(s) -
Shin Yonghwan,
Jeon Baekkyun,
Shin Sungtae,
Lim Soonkwon,
Souk Junhyung,
Odajima Tamotsu
Publication year - 2009
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3256889
Subject(s) - photoresist , laser ablation , materials science , ablation , process (computing) , electrode , etching (microfabrication) , fabrication , laser , optoelectronics , liquid crystal display , coating , optics , nanotechnology , computer science , layer (electronics) , engineering , chemistry , medicine , physics , alternative medicine , pathology , aerospace engineering , operating system
We fabricated the world first 23” PVA LCD panel of which transparent electrode (ITO) was patterned by “laser ablation process”. Generally photo process is used to pattern the transparent electrode. To simplify this photo process we tried to develop laser ablation process to pattern the ITO. Current photo process is composed of 6 steps such as Coating the Photoresist, Baking, Exposure, Development, Etching, and Stripping. But we succeeded in simplifying this process by the laser ablation process. From this experiment, we could identify the possibility of laser ablation process which can be used on the patterning process of transparent electrodes.