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26.4: Enhancement of Discharge Characteristics Using RF‐Plasma Treatment on MgO Layer in 50‐In. Full‐HD AC‐PDPs
Author(s) -
Park ChoonSang,
Tae HeungSik,
Park BongKyoung,
Jung EunYoung,
Ahn JeongChull
Publication year - 2009
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3256788
Subject(s) - plasma display , plasma , luminance , materials science , layer (electronics) , luminous efficacy , power consumption , voltage , analytical chemistry (journal) , optoelectronics , power (physics) , electrode , chemistry , electrical engineering , composite material , optics , physics , chromatography , thermodynamics , quantum mechanics , engineering
The characteristics of the MgO layer are known to be an important parameter that affects both the address and sustain discharge characteristics in an ac‐PDP. In this paper, to improve the discharge characteristics of 50‐in. full‐HD ac‐PDP with He (35%) ‐ Xe (11%) contents, RF‐plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resulting changes in the address and sustain discharge characteristics, including the firing voltage, Vt closed curve, power consumption, luminance, luminous efficiency, and secondary electron coefficient, are then compared for both cases with and without plasma treatment on MgO layer. It is concluded that the Ar plasma treatment can enhance the discharge characteristics, such as the firing voltage and power consumption, which are caused by an increase in the secondary electron coefficient.