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P‐157: Highly‐Efficient Gas Diffusion Barriers Based on Nanolaminates Prepared by Low‐Temperature ALD
Author(s) -
Meyer Jens,
Schneidenbach Daniel,
Görrn Patrick,
Bertram Franz,
Winkler Thomas,
Hamwi Sami,
Johannes HansHermann,
Riedl Thomas,
Kowalsky Wolfgang,
Hinze Peter,
Weimann Thomas
Publication year - 2009
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3256661
Subject(s) - atomic layer deposition , materials science , permeation , encapsulation (networking) , oled , diffusion barrier , water vapor , chemical engineering , analytical chemistry (journal) , nanotechnology , layer (electronics) , chemistry , environmental chemistry , organic chemistry , computer network , biochemistry , membrane , computer science , engineering
Gas diffusion barriers based on nanolaminates of alternating Al 2 O 3 /ZrO 2 layers prepared by atomic layer deposition at 80 °C are presented. Water vapor permeation rates as low as 4.7×10 −5 g/(m 2 day) are determined (at 70 °C and 70 % rh). Compared to single Al 2 O 3 encapsulation layers, a reduced density of statistical defects is found. The reliable nanolaminate encapsulation is demonstrated by OLED lifetime measurements.