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49.4: Direct Imaging System by using a UV Pulse Laser and Small Variable Aperture Masks for Color Filter (CF) Fabrication
Author(s) -
Shigeno Yukihide,
Koyagi Yasuyuki
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069774
Subject(s) - fabrication , optics , aperture (computer memory) , laser , materials science , feature (linguistics) , filter (signal processing) , variable (mathematics) , pulse (music) , optoelectronics , physics , computer science , acoustics , computer vision , mathematics , medicine , mathematical analysis , linguistics , philosophy , alternative medicine , pathology , detector
We have now developed a CF fabrication system, which have some small variable masks and expose by the UV pulse laser. The system can handle maximum 8th generation substrates. The feature is that the masks consist of 2 movable apertures and the sizes of apertures are relatively small (about 120 * 150 mm for one imaging head).