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49.3: Mechanism and Advanced Application of Rapid Laser Processing on SnO 2 Thin Films for FPD Manufacture
Author(s) -
Usui Reo,
Mihara Yu,
Morinaga Eiji,
Iwata Yoshiharu,
Satoh Ryohei
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069773
Subject(s) - materials science , thin film , laser , deposition (geology) , optoelectronics , etching (microfabrication) , pulsed laser deposition , nanotechnology , optics , paleontology , physics , layer (electronics) , sediment , biology
A Nd:YAG laser processing on a SnO 2 ‐system thin films for FPD manufacturing is investigated as an alternative to photolithographic etching on ITO. Because of the difficulty in realizing a low energy process on SnO 2 due to a high melting point, we experimentally found the proper deposition condition and composition of SnO 2 ‐system thin films. By considering two physical mechanisms, namely, plasmon oscillation and inverse bremsstrahlung process, we achieved satisfactory laser processing using only 2 J/cm 2 of laser energy. This result leads to the possibility of high‐speed electrode patterning suitable for FPD mass production.