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23.4: Invited Paper : Active‐Matrix Backplanes Produced by Roll‐to‐Roll Self‐Aligned Imprint Lithography (SAIL)
Author(s) -
Jackson Warren B.,
AlmanzaWorkman Marcia,
Chaiken Alison,
Garcia Robert A.,
Jeans Albert,
Kwon Ohseung,
Luo Hao,
Mei Ping,
Perlov Craig,
Taussig Carl,
Braymen Stephen,
Jeffrey Frank,
Hauschildt Jason
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069658
Subject(s) - backplane , active matrix , lithography , materials science , fabrication , transistor , matrix (chemical analysis) , nanotechnology , process (computing) , optoelectronics , thin film transistor , engineering , electrical engineering , computer science , composite material , voltage , medicine , alternative medicine , layer (electronics) , pathology , operating system
Progress in the development of a fully roll‐to‐roll self‐aligned imprint process for producing active matrix backplanes with submicron aligned features on flexible substrates is reported. High performance transistors, crossovers and addressable active matrix arrays have been designed and fabricated using imprint lithography. Such a process has the potential of significantly reducing the costs of large area displays. The progress, current status and remaining issues of this new fabrication technology are presented.