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P‐151: Fabrication of Nano‐Crystalline Graphite Field Emission Device by Thick‐Film Technology
Author(s) -
Chiang MeiTsao,
Jeng JianMin,
Shih WenChing,
Lo ChiTsung,
Yang TzungHan,
Mo ChiNeng,
Li HungYuan
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069519
Subject(s) - graphite , materials science , field electron emission , fabrication , deposition (geology) , nano , hydrogen , nanotechnology , cathode , chemical engineering , composite material , electron , chemistry , medicine , paleontology , physics , alternative medicine , organic chemistry , pathology , quantum mechanics , sediment , engineering , biology
The purpose of this paper is to fabricate nano‐crystalline graphite (NCG) material by reactive R.F. magnetron sputtering deposition, then scrape the NCG films to create NCG powder, and finally manufacture this into NCG paste. When depositing the NCG films, the atomic hydrogen from hydrogen and methane was introduced to increase the surface roughness of the NCG films, etch the NCG films to create the NCG sheet structure. It was found that the electron field emission properties are not affected through the heat treatment process during screen‐printing. The NCG emitter patterns were manufactured successfully on cathode by printing the NCG paste. The current density of the emission site is 340.1 μA/cm 2 at 11 V/μm.