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P‐75: Modification of R.G.B. Photo Resists for Color Filters
Author(s) -
Chen ChengHan,
Ho ChunTe,
Liou WeiJen,
Lin HongMing,
Jian ZihJie,
Lin WeiSyuan,
Hsieh WenJen,
Chiu HaoChieh,
Li ChiHsin
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069430
Subject(s) - resist , materials science , nanotechnology , layer (electronics)
In this study, two kinds of modified photo resists are prepared and used to compare with pure photo resist in emitting properties of light. The modified photo resists are the mixture of pure one and certain additives. Different additives, nano glass balls and transparent agents, are added respectively into photo resists of color filters for improving the purities of emitting light. The results indicate the suitable amount of nano glass balls or transparent agents can improve the purities of emitting light and maintain the intensities of light emission.