z-logo
Premium
P‐24: Fabrication of Solution Processed InGaZnO Thin Film Transistor for Active Matrix Backplane
Author(s) -
Kim Gun Hee,
Shin Hyun Soo,
Kim Kyung Ho,
Park Won Jun,
Choi Yoon Jung,
Ahn Byung,
Kim Hyun Jae
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069366
Subject(s) - thin film transistor , backplane , fabrication , materials science , spin coating , active matrix , crystallite , transistor , optoelectronics , thin film , nanotechnology , electrical engineering , layer (electronics) , metallurgy , voltage , engineering , medicine , alternative medicine , pathology
We report the solution processed polycrystalline InGaZnO thin film transistor. The films with molar ratio of In, Ga, and Zn (1: 1: 2) were deposited by spin coating, and the device exhibits an on‐to‐off current ratio of ∼1.88×10 5 and field effect mobility of ∼0.96 cm 2 /Vs, respectively.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom