Premium
69.4: Invited Paper : SELAX Technology for Poly‐Si TFTs Integrated with Amorphous‐Si TFTs
Author(s) -
Kaitoh Takuo,
Miyazawa Toshio,
Miyake Hidekazu,
Noda Takeshi,
Sakai Takeshi,
Owaku Yoshiharu,
Saitoh Terunori
Publication year - 2008
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3069319
Subject(s) - thin film transistor , materials science , production line , liquid crystal display , amorphous silicon , optoelectronics , amorphous solid , silicon , nanotechnology , engineering , mechanical engineering , crystalline silicon , crystallography , chemistry , layer (electronics)
We developed an advanced LTPS (A‐LTPS) manufacturing process, which enables production of LTPS‐TFTs by utilizing the conventional a‐Si TFT production line. The a‐Si TFT process was combined with selectively enlarging laser crystallization (SELAX) technology to improve the carrier mobility in the region where the peripheral circuits are to be fabricated. A 2.4‐inch IPS‐LCD panel for personal digital assistant use was successfully fabricated using the developed technology.