69.2: New R2PAT Printing Method for Fabricating TFT Electrodes | Zendy

Tanaka Masanobu | Zendy; Ishihara Hirotsugu | Zendy; Shimamura Toshiki | Zendy; Machida Akio | Zendy; Kamei Takahiro | Zendy; Ogawa Masataka | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

69.2: New R2PAT Printing Method for Fabricating TFT Electrodes

Author(s) -

Tanaka Masanobu,

Ishihara Hirotsugu,

Shimamura Toshiki,

Machida Akio,

Kamei Takahiro,

Ogawa Masataka

Publication year - 2008

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.3069316

Subject(s) - thin film transistor , fabrication , electrode , materials science , inkwell , optoelectronics , residual , nanotechnology , computer science , composite material , layer (electronics) , chemistry , algorithm , medicine , alternative medicine , pathology

We have developed a low contact pressure Residual ink Removed Pattern Transfer (R2PAT) printing method which allows fully additive, vacuum‐free TFT electrode fabrication. A 900nm resolution and ±1um alignment accuracy has been achieved. A TFT fabricated using this method had demonstrated 33.9 cm 2 /Vs mobility and a 10 8 I on /I off ratio.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research