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60.3: Advanced Application of Direct Laser Process on SnO 2 Thin Films for FPDs
Author(s) -
Usui Reo,
Mihara Yu,
Satoh Ryohei,
Mihara Yu,
Morinaga Eiji,
Iwata Yoshiharu
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785655
Subject(s) - materials science , thin film , laser , process window , photolithography , etching (microfabrication) , optoelectronics , doping , tin , indium , indium tin oxide , lithography , nanotechnology , optics , metallurgy , layer (electronics) , physics
Abstract A Nd:YAG laser process on pure and doped SnO 2 thin films was investigated as a key technology for a next generation flat panel displays manufacture replacing photolithography etching process on Indium‐Tin‐Oxide that is currently in use. It is found that the laser process is capable of making fine micro patterns on SnO 2 thin films that have high carrier concentration by as low laser energy as 6J/cm 2 .