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53.1: Invited Paper : LITI (Laser Induced Thermal Imaging) Technology for High‐Resolution and Large‐Sized AMOLED
Author(s) -
Lee Seong Taek,
Suh Min Chul,
Kang Tae Min,
Kwon Young Gil,
Lee Jae Ho,
Kim Hye Dong,
Chung Ho Kyoon
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785622
Subject(s) - oled , materials science , laser , fabrication , optoelectronics , brightness , resolution (logic) , high resolution , scalability , amoled , thermal , stack (abstract data type) , layer (electronics) , optics , nanotechnology , computer science , medicine , physics , alternative medicine , remote sensing , pathology , database , artificial intelligence , geology , meteorology , active matrix , programming language , thin film transistor
In this paper, we describe a novel color patterning method for the fabrication of high resolution and large format full‐color AMOLEDs. Laser Induced Thermal Imaging (LITI) is a laser addressed thermal patterning technology with unique advantages such as excellent transfer film thickness uniformity, multi‐layer stack transfer ability, high resolution and scalability to large‐Size mother glass. We developed and optimized transfer films, structure of OLED layers, and scanning conditions for the patterning of the evaporated small molecules. As a result, we achieved excellent LITI device stability, which gave the device life time is more than 20,000 hrs with 2.0″ QVGA device architecture for 150 cd/m 2 white brightness. As a first step toward the mass production, we set up Gen 4 LITI pilot system.