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31.3: Rapid Laser Patterning of ITO on Glass for Next Generation Plasma Display Panel Manufacture
Author(s) -
Henry Matt,
Harrison Paul M.,
Wendland Jozef
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785527
Subject(s) - plasma display , lithography , materials science , laser , flat panel display , plasma , flat panel , plasma etching , maskless lithography , process (computing) , optoelectronics , nanotechnology , photolithography , etching (microfabrication) , optics , computer science , resist , electron beam lithography , chemistry , computer graphics (images) , physics , electrode , quantum mechanics , layer (electronics) , operating system
Rapid Laser Patterning (RLP) of ITO on glass offers a cost effective alternative to wet‐etch lithography in the manufacture of PDPs. It is demonstrated that RLP can effectively pattern ITO to industrial standards. It is also shown that the process is rapid and has major cost benefits vs. lithography.