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31.2: Distinguished Student Paper : Ultra‐Slim Barrier Ribs for Plasma Display Panel by X‐ray Lithography Process
Author(s) -
Ryu SeungMin,
Han Manhee,
Yang DongYol,
Lee Seung S.,
Kim Dong Ju,
Park Lee Soon
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785526
Subject(s) - lithography , fabrication , materials science , x ray lithography , next generation lithography , plasma display , process (computing) , nanotechnology , optoelectronics , resist , electron beam lithography , computer science , physics , medicine , alternative medicine , electrode , pathology , layer (electronics) , quantum mechanics , operating system
Abstract X‐ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of closed‐cell type ultra‐slim barrier ribs for PDP. In this paper, ultra‐slim barrier ribs of 12 μm upper width before sintering were fabricated by x‐ray lithography.