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29.2: A Novel Pixel Structure to Eliminate Thick Organic Overcoat on the Array Substrate of AS‐IPS Mode for TFT‐LCDs
Author(s) -
Lin JiunnShyong,
Shih PoSheng,
Liao TaiShun,
Chang MingChieh,
Lin RongHui,
Yang KeiHsiung,
Lin PingHo,
Wu ChunTe,
Huang MingPin
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785518
Subject(s) - materials science , optoelectronics , substrate (aquarium) , leakage (economics) , contrast ratio , lithography , thin film transistor , pixel , optics , strips , nanotechnology , composite material , layer (electronics) , oceanography , physics , economics , macroeconomics , geology
A novel low‐cost and high contrast‐ratio IPS (in‐plane switching) LC mode, named Advanced Super Non‐Organic Overcoat (AS‐NOOC), has been successfully developed. Compared to the published AS‐IPS mode, the AS‐NOOC mode has the advantages of simpler process for lower manufacture cost by the elimination of a lithographic process step to form thick organic overcoat on the array substrate, and a higher contrast ratio by using narrow strips of black matrix serving as common electrodes on the color‐filter substrate to reduce the light leakage caused by fringe fields of data‐bus lines in the dark state of the display.

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