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P‐101: Nanogap Fabrication on Palladium Electrodes for Field Emission Display Applications
Author(s) -
Tsai ChihHao,
Chen KuanJung,
Pan FuMing,
Lo HsiangYu,
Li Yiming,
Liu Mei,
Mo ChiNeng
Publication year - 2007
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2785368
Subject(s) - materials science , field electron emission , palladium , electrode , fabrication , optoelectronics , plasma , hydrogen , electric field , focused ion beam , voltage , surface finish , nanotechnology , cathode ray , enhanced data rates for gsm evolution , low voltage , ion , electron , chemistry , electrical engineering , catalysis , composite material , alternative medicine , pathology , computer science , engineering , telecommunications , biochemistry , quantum mechanics , medicine , physics , organic chemistry
We have used focused ion beam (FIB) to produce nanogaps on palladium thin film line electrodes. The two facing cross‐sections of the as‐prepared nanogap were smooth and exhibited a large turn‐on voltage for electron field emission depending on the separation of the gap. Hydrogen plasma treatment was used to increase the edge roughness of the nanogap, and thereby dramatically improve the field emission characteristics. for a gap with a separation of 90 nm, the turn‐on voltage reduced to 50 V from 175 V after the hydrogen plasma treatment.