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Development of rapid thermal processor for large‐glass LTPS production
Author(s) -
Shin Dong Hoon,
Kim HyoungJune
Publication year - 2007
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.2739798
Subject(s) - thin film transistor , materials science , crystallization , compatibility (geochemistry) , thermal , liquid crystal display , oled , throughput , process engineering , production line , yield (engineering) , optoelectronics , computer science , nanotechnology , composite material , mechanical engineering , chemical engineering , operating system , physics , layer (electronics) , meteorology , engineering , wireless
— A field‐enhanced rapid‐thermal‐processor (FE‐RTP) system that enables LTPS LCD and AMOLED manufacturers to produce poly‐Si films at low cost, high throughput, and high yield has been developed. The FE‐RTP allows for diverse process options including crystallization, thermal oxidation of gate oxides, and fast pre‐compactions. The process and equipment compatibility with a‐Si TFT manufacturing lines provides a viable solution to produce poly‐Si TFTs using a‐Si TFT lines.