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Noise‐margin analysis of a‐Si:H digital circuits
Author(s) -
Li Zi,
Venugopal Sameer,
Shringarpure Rahul,
Allee David R.,
Clark Lawrence T.
Publication year - 2007
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.2723882
Subject(s) - electronic circuit , duty cycle , robustness (evolution) , digital electronics , computer science , noise margin , noise (video) , transistor , electronic engineering , margin (machine learning) , materials science , voltage , electrical engineering , engineering , biochemistry , chemistry , artificial intelligence , machine learning , image (mathematics) , gene
— The noise margin is one of the fundamental metrics in evaluating the viability and robustness of digital circuits. An analytical model of amorphous‐silicon digital‐circuit noise margin was developed, including the effects of circuit aging. The threshold voltage of a‐Si:H transistors increases over time with electrical stress, degrading the performance and eventually leading to circuit wear‐out. Since static and dynamic inverters are the basic digital‐circuit design elements, they are the basis for this analysis. The analytical model is verified with experimental measurements. The lifetime of dynamic a‐Si:H digital circuits is found to exceed the lifetime for static a‐Si:H circuits by a factor of 2–3. Although the lifetimes are relatively short (∼10 5 sec) and under continuous electrical stress, they are sufficient for low‐duty‐cycle applications.