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P‐178: A 1.52‐in. Full‐Color Passive‐Matrix OLED with Nitrogen Plasma Treatments
Author(s) -
Kang Seong Jong,
Lee Ho Chul,
Yi Jung Yoon,
Hwang Jo Il,
Kim Jeong Moon,
Roh Byeong Gyu,
Kim Woo Young
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433664
Subject(s) - oled , plasma , materials science , nitrogen , full color , plasma display , layer (electronics) , optoelectronics , chemistry , nanotechnology , electrode , organic chemistry , physics , quantum mechanics
Full color 1.52″ 130×130 PM OLED display was fabricated with treatment of nitrogen plasma. The work function of ITO before plasma treatment was 4.81eV while it changed 4.99∼5.02eV after nitrogen plasma treatment. After the plasma treatment, we prepare a full color passive matrix OLED device with structure of ITO/2‐TNATA/α‐NPD/Alq3: DJCTB, Alq3: C545T, DPVBi/BAlq/Alq3/LiF/Al: Li. The lifetime of OLED devices using nitrogen plasma treatment is 1.5 times better than that using oxygen plasma treatment as well as low process cost in the same layer structure of OLED devices.