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P‐176: Optimization of Photoalignment Conditions for a New Alignment Layer with Cinnamate Moiety
Author(s) -
Lee JangJu,
Kee HeeJin,
Kim Hong Doo,
Paek SangHyon,
Lee Byung Hyun
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433659
Subject(s) - alicyclic compound , moiety , rubbing , thermal stability , layer (electronics) , materials science , copolymer , thermal , chemical engineering , polymer chemistry , chemistry , polymer , nanotechnology , composite material , organic chemistry , thermodynamics , physics , engineering
For a cinnamate‐branched alicyclic copolymer, we have investigated the effects of various LPUV exposure parameters on photoinduced LC alignment over it. The alignment induced at the optimal exposure conditions has shown excellent uniformity, a large LC order parameter and a good thermal stability, which is comparable to the rubbing‐induced alignment.