P‐224L:  Late‐News Poster : Enhancing the Optical Resolution of a Mask Metrology System using a Software Algorithm | Zendy

Wahlsten Mikael | Zendy; Bergman Lars | Zendy; Ekberg Peter | Zendy; Larson JohnOscar | Zendy; Lidén Per | Zendy; Sydow Axel | Zendy; Stiblert Lars | Zendy

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P‐224L: Late‐News Poster : Enhancing the Optical Resolution of a Mask Metrology System using a Software Algorithm

Author(s) -

Wahlsten Mikael,

Bergman Lars,

Ekberg Peter,

Larson JohnOscar,

Lidén Per,

Sydow Axel,

Stiblert Lars

Publication year - 2006

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.2433535

Subject(s) - metrology , resolution (logic) , software , inverse filter , filter (signal processing) , inverse , computer science , optical filter , dimensional metrology , algorithm , optics , artificial intelligence , computer vision , physics , mathematics , geometry , programming language

In this paper, we present how to enhance the resolution in an optical mask metrology system. The resolution is enhanced using an inverse filter based upon a model of the optical system. The filter is implemented in software, thus we achieve a higher resolution without requiring high resolution optical design.

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