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P‐224L: Late‐News Poster : Enhancing the Optical Resolution of a Mask Metrology System using a Software Algorithm
Author(s) -
Wahlsten Mikael,
Bergman Lars,
Ekberg Peter,
Larson JohnOscar,
Lidén Per,
Sydow Axel,
Stiblert Lars
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433535
Subject(s) - metrology , resolution (logic) , software , inverse filter , filter (signal processing) , inverse , computer science , optical filter , dimensional metrology , algorithm , optics , artificial intelligence , computer vision , physics , mathematics , geometry , programming language
In this paper, we present how to enhance the resolution in an optical mask metrology system. The resolution is enhanced using an inverse filter based upon a model of the optical system. The filter is implemented in software, thus we achieve a higher resolution without requiring high resolution optical design.