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P‐21: Investigation of Pattern‐Induced Brightness Non‐Uniformity in AMOLED Displays
Author(s) -
Kim KyoungBo,
Park HyeHyang,
Kwon Ohseob,
Lee KilWon,
Lee KiYong,
Ahn Jisu,
Seo JinWook,
Song SuBin,
Kim Moojin,
Yang TaeHoon,
Park Byoung Keon,
Lisachenko Maxim,
Jung SeiHwan,
Choi Daechul,
Choi Byoung,
Kim HyeDong,
Chung HoKyoon
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433470
Subject(s) - brightness , amoled , thin film transistor , materials science , moiré pattern , optoelectronics , line (geometry) , optics , active matrix , layer (electronics) , nanotechnology , physics , geometry , mathematics
We found that pattern‐induced line type brightness non‐uniformity is related to moiré patterns that appear when primary grain boundaries in SLS processed poly‐Si are aligned over repetitive TFT patterns such as metal lines. We propose a method to diminish the Moiré pattern type non‐uniformity by adopting black matrix and top emission TFT structure.