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53.4: Treatments in ELA Process to Improve the Image Quality in AMOLED Displays
Author(s) -
Peng KangChia,
Peng Yao,
Ho MinChe
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433333
Subject(s) - amoled , materials science , recrystallization (geology) , excimer laser , oled , annealing (glass) , streak , optoelectronics , laser , nanotechnology , composite material , optics , active matrix , thin film transistor , paleontology , physics , layer (electronics) , biology
Supplementary treatments combined with the standard Excimer Laser Annealing (ELA) process are introduced to poly‐Si recrystallization. The surface condition of the poly silicon film becomes more uniform and smoother after these treatments. The variation of the current that drives AMOLED is reduced from 30% to 12%. The streak mura caused by ELA process has been greatly reduced as well. Finally, the image quality of AMOLED is highly improved.