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36.4: Characteristics of MgO Layer Deposited under Hydrogen Atmosphere
Author(s) -
Park KyungHyun,
Kim YongSeog
Publication year - 2006
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2433244
Subject(s) - hydrogen , materials science , layer (electronics) , evaporation , cathode , atmosphere (unit) , microstructure , electron beam physical vapor deposition , luminescence , coating , analytical chemistry (journal) , composite material , chemistry , optoelectronics , thin film , nanotechnology , environmental chemistry , meteorology , physics , organic chemistry
Characteristics of MgO layer deposited under hydrogen atmosphere were investigated. Hydrogen gas was introduced during e‐beam evaporation coating process of MgO layer and its effects on microstructure, cathode luminescence spectra, discharge voltages and effective yield of secondary electron emission were examined. The results indicated that the hydrogen influences the concentration and energy levels of defects in MgO layer and that affects the luminance efficiency and discharge delays of the panels significantly.