Premium
Second wind of the oblique deposition method of liquid‐crystal alignment: Ion‐beam sputtering technique
Author(s) -
Khakhlou A.,
Murauski A.,
Yaroshchuk O.,
Telesh E.,
Kravchuk R.
Publication year - 2006
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.2185274
Subject(s) - citation , oblique case , physics , computer science , art history , philosophy , world wide web , art , linguistics
Abstract— Liquid‐crystal (LC) alignment on SiO x films produced by ion‐beam sputtering deposition was comprehensively studied. The conditions for planar, tilted planar, homeotropic, and tilted homeotropic LC alignment of high uniformity were determined. The alignment photostability and aging issue are discussed. An original sputtering system based on the anode‐layer source excelling in high reliability and quality of sputtered coatings were used. Because this system can be easily scaled up, the alignment treatment of the large‐area alignment substrates, including those used in modern LCD manufacturing, can be realized. The advantages of the sputtering LC alignment technique, in comparison with its vapor‐deposition predecessor, are described.