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6.3: Impact of CVD Film Deposition on Pitch Change
Author(s) -
Hoysan S. F.,
Johnson P. O.
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036546
Subject(s) - deposition (geology) , materials science , substrate (aquarium) , stress (linguistics) , variation (astronomy) , composite material , thin film , nanotechnology , geology , physics , paleontology , linguistics , oceanography , philosophy , sediment , astrophysics
Abstract Thin films deposited on the substrate during deposition processes such as CVD create stress in the film and in the glass substrate. This film stress alters the size and shape of the substrate, causing a pitch change. Variation in the deposition process causes pitch variation. A method is presented to calculate the pitch change using the film stress and thickness parameter. Comments are made with regard to pitch variation on the substrate.