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P‐68: Plano‐Eucentric Photometry System for Micro‐Display Metrology
Author(s) -
Lamvik Michael,
Grego Sonia
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036495
Subject(s) - metrology , photometry (optics) , system of measurement , computer science , focus (optics) , field of view , optics , physics , computer vision , astronomy , stars
We describe a unique micro‐display metrology system in which the stage can be rotated arbitrarily and the area of interest does not leave the field of view. Similarly, the sample can be tilted up to 60 degrees and the area of interest stays continuously in focus. The mechanism operates instantaneously and does not depend on computers or motors to achieve correct centering. This capability facilitates the rapid measurement of micro‐display characteristics over a wide range of angles.