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P‐61: Photosensitive Insulating Materials by Organic/Inorganic Hybrid Technologies as a Passivation Layer on TFT LCDs
Author(s) -
Nakamura Shigeru,
Azuma Kenichi,
Unate Takao,
Nakasuga Akira,
Matsukawa Kimihiro
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036487
Subject(s) - passivation , photolithography , materials science , photosensitivity , thin film transistor , layer (electronics) , optoelectronics , nanotechnology
Novel silica‐based spin on glass (SOG) materials by organic/inorganic hybrid technologies have high photosensitivity, insulating performance, transparency, and heat resistance. These materials can make a passivation layer on TFT LCDs with only standard photolithography process and low heat treatment, and thus they provide a novel vacuum‐less process on TFT LCDs.