P‐61: Photosensitive Insulating Materials by Organic/Inorganic Hybrid Technologies as a Passivation Layer on TFT LCDs | Zendy

Nakamura Shigeru | Zendy; Azuma Kenichi | Zendy; Unate Takao | Zendy; Nakasuga Akira | Zendy; Matsukawa Kimihiro | Zendy

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P‐61: Photosensitive Insulating Materials by Organic/Inorganic Hybrid Technologies as a Passivation Layer on TFT LCDs

Author(s) -

Nakamura Shigeru,

Azuma Kenichi,

Unate Takao,

Nakasuga Akira,

Matsukawa Kimihiro

Publication year - 2005

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.2036487

Subject(s) - passivation , photolithography , materials science , photosensitivity , thin film transistor , layer (electronics) , optoelectronics , nanotechnology

Novel silica‐based spin on glass (SOG) materials by organic/inorganic hybrid technologies have high photosensitivity, insulating performance, transparency, and heat resistance. These materials can make a passivation layer on TFT LCDs with only standard photolithography process and low heat treatment, and thus they provide a novel vacuum‐less process on TFT LCDs.

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