P‐60: Thin‐beam Directional X'tallization Method for SOP and OLED Application | Zendy

Park JiYong | Zendy; Im Chai In | Zendy; Hofmann Thomas | Zendy; Knowles David S. | Zendy

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P‐60: Thin‐beam Directional X'tallization Method for SOP and OLED Application

Author(s) -

Park JiYong,

Im Chai In,

Hofmann Thomas,

Knowles David S.

Publication year - 2005

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1889/1.2036485

Subject(s) - beam (structure) , materials science , optics , enhanced data rates for gsm evolution , optoelectronics , thin film , laser beams , excimer laser , laser , physics , computer science , nanotechnology , telecommunications

We propose a Thin‐beam Directional X' tallization (TDX) method, based on a high power, high repetition rate XeF excimer laser source and special optics, to produce a long, narrow (∼ 5 micron) beam with sharp edge slope. We present experimental results from a prototype TDX system that demonstrates very uniform directional laterally grown poly‐Si films without any grain boundary protrusions.

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