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P‐60: Thin‐beam Directional X'tallization Method for SOP and OLED Application
Author(s) -
Park JiYong,
Im Chai In,
Hofmann Thomas,
Knowles David S.
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036485
Subject(s) - beam (structure) , materials science , optics , enhanced data rates for gsm evolution , optoelectronics , thin film , laser beams , excimer laser , laser , physics , computer science , nanotechnology , telecommunications
We propose a Thin‐beam Directional X' tallization (TDX) method, based on a high power, high repetition rate XeF excimer laser source and special optics, to produce a long, narrow (∼ 5 micron) beam with sharp edge slope. We present experimental results from a prototype TDX system that demonstrates very uniform directional laterally grown poly‐Si films without any grain boundary protrusions.