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P‐16: Novel Four‐Mask Process in the FFS TFT‐LCD with Optimum Multiple‐Slit Design Applied by the use of a Gray‐Tone Mask
Author(s) -
Choi Seungjin,
Cho Jinhui,
Han KyuYong,
Jang J. H.,
Park J. G.,
Yoon H. J.,
Yoon B. N.,
Ihm S. H.,
Lim Young Jin
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036425
Subject(s) - liquid crystal display , slit , thin film transistor , process window , process (computing) , backlight , ripple , electrode , computer science , materials science , electronic engineering , computer hardware , engineering , optics , optoelectronics , electrical engineering , voltage , physics , operating system , quantum mechanics
In order to simplify the array manufacturing process of FFS TFT‐LCD, novel four‐mask process which is adopted to the optimum multiple‐slit design in the common electrode and contact hole has been developed. The adoption of the optimum multiple‐slit design is able to support stable process margin without ripple of gray‐tone. Moreover, continuous process by etching of the gate and transparent common electrode simplify array process of FFS devices.