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59.1: Invited Paper: National FED Project in Japan
Author(s) -
Soichiro Okuda,
Shuhei Nakata,
Tetsuya Shiroishi,
Kunihiko Nishimura,
Mikio Takai,
Sashiro Uemura,
Junko Yotani,
Hiroyuki Kurachi,
Nobuaki Hayashi,
Makoto Okai,
Tsunehiko Sugawara,
Takahiro Murakami,
Yuichi Kuroki
Publication year - 2005
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.2036346
Subject(s) - common emitter , materials science , carbon nanotube , chemical vapor deposition , insulator (electricity) , etching (microfabrication) , optoelectronics , polymer , nanotechnology , composite material , layer (electronics)
Japanese government has started a three‐year project on carbon nanotube (CNT) FED in 2003. The feasibility of uniform CNT electron source both by chemical vapor deposition (CVD) method and printing method has been proved. The high‐temperature CVD extended the applicability to fine pitch of 0.2mm. The emitter fabricated by low‐temperature CVD proved to be driven with low voltage. The printing method employs a new etching process of silicone‐ladder polymer insulator combined with laser irradiation surface‐treatment. A spacer‐free glass panel structure and a new sealing material applicable under low temperature have been sucessfully applied to test panels.