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Optimized ITO thin films from ultra‐high‐density single‐phase targets
Author(s) -
Lupton D. F.
Publication year - 1999
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.1985289
Subject(s) - materials science , sputtering , thin film , optoelectronics , stoichiometry , conductance , phase (matter) , sputter deposition , nanotechnology , condensed matter physics , chemistry , physics , organic chemistry
— Fundamental requirements of sputter targets are discussed with regard to the mechanisms of conductance and transmission in ITO films. A novel, fully integrated process for the manufacture of targets is described which ensures excellent, highly reproducible sputtering characteristics. The targets are characterized by ultra‐high uniform density, and they are closely matched to the crystal structure, charge‐carrier density, and oxygen stoichiometry of optimum ITO thin films.