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A simplified a‐Si:H TFT process for large‐area AMLCDs
Author(s) -
Glueck Joachim
Publication year - 1997
Publication title -
journal of the society for information display
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 52
eISSN - 1938-3657
pISSN - 1071-0922
DOI - 10.1889/1.1985152
Subject(s) - fabrication , thin film transistor , process (computing) , process window , computer science , diagonal , window (computing) , active matrix , materials science , pixel , optoelectronics , artificial intelligence , nanotechnology , layer (electronics) , medicine , alternative medicine , geometry , mathematics , pathology , operating system
— A 14‐in.‐diagonal a‐Si TFT AMLCD for PAL‐TV is presented. The layout design is insensitive to fabrication tolerances, and the manufacturing process combines a low mask count of four steps with a large process window. Pixel charging with respect to fabrication tolerances is simulated and optimized. A direct‐view color display with 1.2 Mpixels was fabricated.