A novel deposition method for thin‐film electroluminescent devices | Zendy

Hiskes R. | Zendy; DiCarolis S. A. | Zendy; MuellerMach R. | Zendy; Mazzi V. | Zendy; Nauka K. | Zendy; Mueller G. O. | Zendy

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A novel deposition method for thin‐film electroluminescent devices

Author(s) -

Hiskes R.,

DiCarolis S. A.,

MuellerMach R.,

Mazzi V.,

Nauka K.,

Mueller G. O.

Publication year - 1997

Publication title -

journal of the society for information display

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.578

H-Index - 52

eISSN - 1938-3657

pISSN - 1071-0922

DOI - 10.1889/1.1985135

Subject(s) - electroluminescence , materials science , phosphor , flammable liquid , metalorganic vapour phase epitaxy , thin film , optoelectronics , chemical vapor deposition , deposition (geology) , electroluminescent display , luminous efficacy , nanotechnology , layer (electronics) , chemistry , organic chemistry , paleontology , epitaxy , sediment , biology

— Thin ZnS:Mn and SrS:Ce electroluminescent films are grown by solid‐source metal‐organic chemical vapor deposition (MOCVD). The method is attractive because it uses relatively non‐toxic materials and does not require flammable hydrogen or toxic H 2 S. Performance results are presented for both blue‐ and white‐emitting phosphors. Even though the method has not yet been optimized, luminous efficacy of 3 lm/W at low drive voltages has been attained for ZnS: Mn.

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