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44.3: Inhomogeneous Thin‐Film Optical Coatings for Flat‐Panel‐Display Applications
Author(s) -
Lim S.,
Chang H.,
Wager J. F.
Publication year - 1999
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1834180
Subject(s) - plasma enhanced chemical vapor deposition , materials science , thin film , plasma display , flat panel display , flat panel , silicon oxynitride , chemical vapor deposition , reflection (computer programming) , filter (signal processing) , optoelectronics , deposition (geology) , optics , plasma , silicon , optical filter , nanotechnology , computer science , electrical engineering , silicon nitride , chemistry , engineering , biology , paleontology , quantum mechanics , programming language , physics , electrode , sediment
Optical reflection filters for red, green, and blue colors for information display application could be easily fabricated by using inhomogeneous silicon oxynitride(SiON) thin films. Plasma‐enhanced chemical vapor deposition (PECVD) was used to deposit SiON thin film, A band rejection filter with its rejection peak at 490nm was designed and fabricated by the computer‐controlled PECVD.