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P‐37: Electron‐Beam Mirror Projector
Author(s) -
Dabbaj R. H.
Publication year - 1999
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1834097
Subject(s) - projector , optics , schlieren , cathode ray , beam (structure) , materials science , spatial light modulator , resolution (logic) , electron beam lithography , physics , optoelectronics , electron , computer science , nanotechnology , layer (electronics) , quantum mechanics , artificial intelligence , resist
The Electron‐Beam Mirror “EBM” projector is an electron‐beam addressed light valve modulator. It used a light‐modulating and supporting layers inside a small CRT, and a schlieren optical system. The EBM has the highest known diffraction efficiency among light‐valves, produced 15 um resolution and around 1E‐8 C/sq. cm sensitivity, and can be made into large‐area modulator. Among EBM% potential applications include high resolution single‐modulator auto‐convergent simultaneous‐colour projectors, and large areas LV modulators.

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