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Ultra Fine Aperture Grille for CDTs
Author(s) -
Makita A.,
Komatsu T.,
Fujiyama K.,
Ishii Y.,
Hashimoto D.
Publication year - 1999
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1834008
Subject(s) - aperture (computer memory) , smoothness , transmittance , materials science , optics , optoelectronics , acoustics , physics , mathematics , mathematical analysis
A new method for producing ultra fine aperture grilles for CDTs has been developed. This new approach can produce 0.125mm pitch aperture grille for 21‐in 200‐dpi ultra fine CDTs while providing the same optical transmittance and white uniformity as those of conventional ones. Good narrow aperture performance is combined with an excellent smoothness of grille edges. This technology also allows a range of finer pitch shadowmasks as well as aperture grilles to be made practical for further high resolution CDTs.