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29.2: High‐Rate Deposition of MgO Films for ACPDPS by Activated Reactive Evaporation Using Hollow‐Cathode Discharge (HCD‐ARE)
Author(s) -
Hakomori M.,
Matsuzaki K.,
Kurauchi T.,
Matsuura M.,
Yamakawa H.
Publication year - 1998
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.1833902
Subject(s) - deposition (geology) , materials science , evaporation , cathode , substrate (aquarium) , chemical engineering , analytical chemistry (journal) , chemistry , chromatography , paleontology , physics , oceanography , sediment , engineering , biology , geology , thermodynamics
We have developed a new MgO film synthesizing method employing HCD‐ARE which enables high film deposition rates up to 73nmls. This method was found to prevent thermal damage to the glass substrate during deposition. The discharge voltage characteristics of AC‐PDPS protected by MgO film prepared by HCD‐ARE were determined to be sufficient for practical application.